E-Beam Lithography

Raith 150

• Schottky thermal-field emission filament, resolution: 2 nm @ 20 kV
• Acceleration voltage: 200 V – 30 kV
• Beam current: 4 pA – 350 pA
• Working distance: 2 – 12 mm
• Writefield: 1 µm – 1 mm
• 16 bits / 10 MHz pattern generator
• Samples: 1 mm – 6”
• Interferometer stage, 2 nm positioning accuracy
• Overlay and stitching accuracy: better than 20nm
• High degree of automation for automatic pattern placement and long exposures

Projects

Visit our Pictures Gallery or download the Application Note (PDF 0.5 MB)

Photonics

• InP-based photonic crystals (Communication Photonics Group)
• Microring resonators (Non-linear Optics Lab.)

Electronics

• InP-based DHBTs for high-speed digital ICs (Electronics Lab.)
• InP HEMTs for low-noise amplifiers (Teraherz Electronics Group)

Quantum Communication

• Entanglement preservation in plasmon-assisted light transmission (Communication Photonics Group)
• Quantum devices (Nanophysics)
• Semiconductor nanowires (NanoPhysics Group, Quantum Photonics Group)
• Quantum photonics (Quantum Photonics Group)
• Quantum Devices (Quantum Devices Group)
  

Nanotubes and Nanowires

• Electricomechanical properties of CNTs (Micro and NanoSystems)
  
• Mechanical properties of CNTs (IRIS)
  
• Mechanical properties of metallic nanowires (Nanometallurgy)
  

Superconducting Materials

• Superconducting Nanostructures (Uni ZH)

The Communication Photonics Group of the Electronics Lab. hosts the development team of the proximity-effects correction software package NanoPECS, now commercialized by Raith GmbH. Download Application Note (PDF 0.55 MB)

Room: HCI B129.8 Nanolithography
Tel: -34614

Responsible:
(1) Franck Robin
(2) Otte Homan