HERALD promotes European research activity in Atomic Layer Deposition (ALD)

HERALD (COST action MP1402) aims to structure and integrate European research activity in atomic layer deposition (ALD), bringing together existing groups, promoting young scientists and reaching out to industry and the public.  ALD is a unique technique for growing ultra-thin films that is enabling new developments in high-tech manufacturing sectors such as electronics, energy and coatings. With interest growing worldwide, the time is right to coordinate European activity in this field.  HERALD has supported collaboration through lab visits, workshops and training schools, as summarised in the list of deliverables.


Formation of HERALD Grant Committee

The following HERALD members have been elected as the Grant Committee, starting in 2019, with responsibility for allocating grants for workshops and other networking purposes in the new HERALD network....Read more

Election of HERALD Grant Committee

From 2019 onwards, decisions on the allocation of funds in the HERALD network will be made by a Grant Committee representing the diversity of the network. Nominations for this committee...Read more

Next Event

Joint International Conference
24 Jun 2019 to 28 Jun 2019
Luxembourg, LU

Join this Action

If you would like to join COST Action MP1402, please send an email to the HERALD Chair.

Further details on joining COST actions can be found on our How to Join page.

Working Groups

To elucidate ALD mechanisms through metrology, especially in situ measurements, and through modeling of growth chemistry.

Joint publications:







To synthesise new chemical precursors and use them in thin film deposition experiments to find viable ALD processes for materials where no process exists at present.

Joint publications:


To achieve control of interfaces through ALD, understanding nucleation, depositing onto 2D materials and developing new approaches to selective-area ALD.

Joint publications:




Workshops for...

To develop and integrate ALD processes for oxides, sulfides and nitrides for applications in transparent electronics, memristors, light emitting devices and nanosensors, in collaboration with industry.

Joint Publications:


To develop processes for the molecular layer deposition (MLD) of hybrid organic/inorganic films, along with optimization of material properties.

Joint Publications:



Workshops for this WG: